Abstract: In modern semiconductor manufacturing, optimizing plasma etching processes is key for advancing technology and achieving profitable production. In this study, we propose an efficient process ...
Abstract: We propose a method that enables real-time endpoint detection during plasma etching of small openings (the absolute area of the opening is at or below 5%) on a wafer. Traditional endpoint ...
This is where things start to get interesting, as Upper Etching introduces a major shake-up in terms of gameplay, as the campus doesn't believe in charging its students, meaning you will not receive ...
† Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea ‡ SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 440-746, ...
School of Resource and Environmental Science, Wuhan University, 299 Bayi Road, Wuchang District, Wuhan, Hubei 430072, P. R. China Hubei International Scientific and Technological Cooperation Base of ...
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